Explore how Raith can help with nanofabrication challenges
Raith develops leading edge lithography systems enabling customers to drive innovation and production for next generation display technology. Our maskless electron beam, laser beam and focused ion beam patterning solutions cover the full range, from µm structures to sub 10 nm critical device fabrication, from small piece parts to large format plates beyond 1 meter. The Raith product portfolio is being complemented by automated SEM based metrolgy and process control systems.
Our worldwide service and customer support structures are backed by experienced experts in our international applications and development centers. We are fully committed to further push the limits of nanofabrication in close collaboration with our outstanding customer base.