McCormick Place | Chicago, Illinois, USA
March 1 - 5, 2020

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Pittcon Party: Chicago

The biggest party, the biggest night of the week, and the biggest opportunity to brand your company. The Pittcon Party will take place Wednesday evening at the Museum of Science and Industry. It will be a night to remember – and a night for attendees to remember you!

Please contact Maranda Flamm at flamm@pittcon.org to discuss sponsorship opportunities for the Pittcon Party.

Fundamentals of Particle Size Analysis with an Emphasis on Light Scattering Techniques

  • Room: Short Course Office S100C
  • Session Number: SC1250
Monday, March 02, 2020: 8:30 AM - 5:00 PM
Duration:1 Day Course

Speaker(s)

Instructor
Alan Rawle
Malvern Panalytical Inc.
Co-Instructor
Ulf Nobbmann
Product Manager - Nanometrics
Malvern Panalytical

Description

A 1-day course that will bring newcomers to the particle sizing field up to speed on the basics (including terminology, international standards and math) of particle size analysis. The main techniques (sieves, sedimentation, electrical sensing zone) will be covered but the main emphasis will be on light scattering techniques in particular dynamic light scattering (DLS; 1 – 1000 nm approx.) and laser diffraction (0.1 –3000 microns approx.)

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Learning Objectives

Session 1 1 hour Introduction & Course Objectives, Particle Sizing Basics – Terms & Terminology & Moment Means. Introduction to sampling
Session 2 1 hour Fundamentals of Laser Diffraction
Session 3 30 minutes Break
Session 4 1 hour Fundamentals of Dynamic Light Scattering (DLS)
Session 5 30 minutes -Optical property constants
Session 6 90 minutes - Lunch
Session 7 45 minutes - Laser diffraction – before and after the measurement
Session 8 45 minutes - Dynamic light scattering – before and after the measurement
Session 9 30 minutes Break
Session 10 Up to 1 hour - Question and Answer Session
Minimum of 5.5 hours direct contact time up to 6.5 hours depending on questions

Additional Info

Target Audience:
Relative newcomers to particle size analysis including laboratory personnel, scientists, graduate students plus those with more experience of the technique but would like more background.



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